File:Silky semiconductor.jpg
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Summary
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| Description |
English: UV microscope image of a 100 nm thick ZnSe semiconductor layer exfoliated using Epitaxial Lift-Off (ELO). The wrinkles on the surface are formed as a result of strain release (The ZnSe layer was initially grown on top of a MgS release layer under slight compressive strain using Molecular Beam Epitaxy (MBE).
[Image produced at Heriot-Watt University, while working with Richard Moug and Kevin Prior] |
| Date | |
| Source | Own work |
| Author | Akhil Rajan |
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I, the copyright holder of this work, hereby publish it under the following license:
This file is licensed under the Creative Commons Attribution-Share Alike 4.0 International license.
- You are free:
- to share – to copy, distribute and transmit the work
- to remix – to adapt the work
- Under the following conditions:
- attribution – You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
- share alike – If you remix, transform, or build upon the material, you must distribute your contributions under the same or compatible license as the original.
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This image was uploaded as part of European Science Photo Competition 2015. |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 16:18, 3 November 2015 | | 1,388 × 1,040 (340 KB) | Akhil UoN (talk | contribs) | User created page with UploadWizard |
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