Information for "Chemical vapor deposition"
Basic information
| Display title | Chemical vapor deposition |
| Default sort key | Chemical vapor deposition |
| Page length (in bytes) | 42,116 |
| Namespace ID | 0 |
| Page ID | 6111 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of page watchers | 175 |
| Number of page watchers who visited in the last 30 days | 4 |
| Number of redirects to this page | 29 |
| Counted as a content page | Yes |
| Wikidata item ID | Q505668 |
| Local description | Method used to apply surface coatings |
| Central description | process used to make thin films for semiconductors or surface coating |
| Page image |  |
| Page views in the past 30 days |
Page protection
| Edit | Allow all users (no expiry set) |
| Move | Allow all users (no expiry set) |
Edit history
| Page creator | Mike Dill (talk | contribs) |
| Date of page creation | 18:58, 16 August 2001 |
| Latest editor | Kku (talk | contribs) |
| Date of latest edit | 07:57, 6 June 2024 |
| Total number of edits | 548 |
| Recent number of edits (within past 30 days) | 0 |
| Recent number of distinct authors | 0 |