Information for "Immersion lithography"
Basic information
| Display title | Immersion lithography |
| Default sort key | Immersion Lithography |
| Page length (in bytes) | 9,972 |
| Namespace ID | 0 |
| Page ID | 642936 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of page watchers | 35 |
| Number of page watchers who visited in the last 30 days | There may or may not be a watching user visiting recent edits |
| Number of redirects to this page | 2 |
| Counted as a content page | Yes |
| Wikidata item ID | Q1076175 |
| Local description | Photolithography technique where there is a layer of water between a lens and a microchip |
| Central description | photolithography technique for manufacturing integrated circuits |
| Page image |  |
| Page views in the past 30 days |
Page protection
| Edit | Allow all users (no expiry set) |
| Move | Allow all users (no expiry set) |
Edit history
| Page creator | D Thong (talk | contribs) |
| Date of page creation | 20:19, 8 May 2004 |
| Latest editor | Seinfeld rocks (talk | contribs) |
| Date of latest edit | 15:03, 14 June 2024 |
| Total number of edits | 309 |
| Recent number of edits (within past 30 days) | 0 |
| Recent number of distinct authors | 0 |