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{{short description|Type of solid state switch}}
[[Image:IGBT N-dep symbol (case).svg|thumb|[[Electronic symbol]] for IGBT]]
{{Infobox electronic component
[[Image:IGBT cross section.svg|right|300px|thumb|Cross section of a typical IGBT. Please note that an IGBT is usually made from many such cells, and that the illustration is not to scale.]]
| name = Insulated-gate bipolar transistor
[[Image:IGBT equivalent circuit EN.svg|thumb|right|Equivalent circuit for IGBT]]
| image = IGBT 3300V 1200A Mitsubishi.jpg
[[Image:IvsV IGBT.png|thumb|300px|Static characteristic of an IGBT.]]
| caption = IGBT module (IGBTs and freewheeling diodes) with a rated current of 1200 A and a maximum voltage of 3300 V
| type =
| working_principle = [[Semiconductor]]
| invented = 1959
| first_produced =
| pins =
| symbol = [[Image:IGBT symbol.svg]]
| symbol_caption = IGBT schematic symbol
}}


The '''insulated gate bipolar transistor''' or '''IGBT''' is a three-terminal [[power semiconductor device]], noted for high efficiency and fast switching. It switches electric power in many modern appliances: electric cars, trains, variable speed refrigerators, air-conditioners and even stereo systems with [[switching amplifier]]s. Since it is designed to rapidly turn on and off, [[amplifier]]s that use it often synthesize complex waveforms with [[pulse width modulation]] and [[low-pass filter]]s.
'''insulatedgate bipolar transistor''' '''IGBT''' is a three-terminal [[power semiconductor device]] . It [[ ]] that [[]] [[ ]].


Although the structure of the IGBT is topologically similar to a [[thyristor]] with a "MOS" gate ([[MOS-controlled thyristor|MOS-gate thyristor]]), the thyristor action is completely suppressed, and only the [[transistor]] action is permitted in the entire device operation range. It is used in [[switching power supply|switching power supplies]] in high-power applications: [[variable-frequency drive]]s (VFDs) for motor control in [[electric car]]s, trains, variable-speed refrigerators, and air conditioners, as well as lamp ballasts, arc-welding machines, [[Uninterruptible Power Supply|uninterruptible power supply]] systems (UPS), and [[Induction cooking|induction stoves]].
The IGBT combines the simple gate-drive characteristics of the [[Power MOSFET|MOSFET]]s with the high-current and low–saturation-voltage capability of [[Bipolar junction transistor|bipolar transistor]]s by combining an isolated gate [[field-effect transistor|FET]] for the control input, and a bipolar power [[transistor]] as a switch, in a single device. The IGBT is used in medium- to high-power applications such as [[switched-mode power supply]], [[traction motor]] control and [[induction heating]]. Large IGBT modules typically consist of many devices in parallel and can have very high current handling capabilities in the order of hundreds of [[ampere]]s with blocking voltages of {{nowrap|6000 [[volts|V]]}}.


Since it is designed to turn on and off rapidly, the IGBT can synthesize complex waveforms with [[pulse-width modulation]] and [[low-pass filter]]s, thus it is also used in [[switching amplifier]]s in sound systems and industrial [[control system]]s. In switching applications modern devices feature [[Pulse repetition frequency|pulse repetition rates]] well into the ultrasonic-range frequencies, which are at least ten times higher than audio frequencies handled by the device when used as an analog audio amplifier. {{As of|2010}}, the IGBT was the second most widely used power transistor, after the [[power MOSFET]].{{cn|date=February 2022}}
The IGBT is a fairly recent invention. The first-generation devices of the 1980s and early 1990s were relatively slow in switching, and prone to failure through such modes as [[latchup]] and [[secondary breakdown]]. Second-generation devices were much improved, and the current third-generation ones are even better, with speed rivaling MOSFETs, and excellent ruggedness and tolerance of overloads.<ref name="A.Nakagawa 1987">A.Nakagawa et al., "Safe operating area for 1200-V non-latch-up bipolar-mode MOSFETs", IEEE Trans. on Electron Devices, ED-34, pp.351-355(1987)</ref>
{| class="wikitable"
|+IGBT comparison table<ref>[http://www.electronics-tutorials.ws/power/insulated-gate-bipolar-transistor.html Basic Electronics Tutorials].</ref>
!Device characteristic
!Power [[Bipolar junction transistor|BJT]]
![[Power MOSFET]]
!IGBT
|-
|Voltage rating
|High <1&nbsp;kV
|High <1&nbsp;kV
|Very high >1&nbsp;kV
|-
|Current rating
|High <500&nbsp;A
|Low <200&nbsp;A
|High >500&nbsp;A
|-
|Input drive
|Current ratio<br /> ''h''<sub>FE</sub> ~ 20–200
|Voltage<br /> ''V''<sub>GS</sub> ~ 3–10 V
|Voltage<br /> ''V''<sub>GE</sub> ~ 4–8 V
|-
|Input impedance
|Low
|High
|High
|-
|Output impedance
|Low
|Medium
|Low
|-
|Switching speed
|Slow (μs)
|Fast (ns)
|Medium
|-
|Cost
|Low
|Medium
|High
|}


==Device structure==
The extremely high pulse ratings of second- and third-generation devices also make them useful for generating large power pulses in areas like [[particle physics|particle]] and [[plasma physics]], where they are starting to supersede older devices like [[thyratron]]s and [[Spark_gap#Power-switching_devices|triggered spark gaps]].


[[Image:IGBT Cross Section.jpg|right|thumb|Cross-section of a typical IGBT showing internal connection of MOSFET and bipolar device]]
Their high pulse ratings, and low prices on the surplus market, also make them attractive to the high-voltage hobbyist for controlling large amounts of power to drive devices such as solid-state [[Tesla coil]]s and [[coilgun]]s.


An IGBT cell is constructed similarly to an n-channel vertical-construction [[power MOSFET]], except the n+ drain is replaced with a p+ collector layer, thus forming a vertical PNP [[bipolar junction transistor]].
Availability of affordable, reliable IGBTs is a key enabler for [[electric vehicle]]s and [[hybrid car]]s. [[Toyota]]'s second generation hybrid [[Prius]] has a 50&nbsp;kW IGBT [[inverter (electrical)|inverter]] controlling two AC motor/generators connected to the DC battery pack.<ref>[http://en.wikibooks.org/wiki/Toyota_Prius/How_it_works Wikibooks], Toyota Prius, How it works</ref>
This additional p+ region creates a cascade connection of a PNP bipolar junction transistor with the surface n-channel [[MOSFET]].

==Difference between Thyristor and IGBT==

{| class="wikitable"
|+ Difference Between Thyristor and IGBT<ref>[https://www.nevsemi.com/blog/igbt-vs-thyristor Difference Between IGBT and Thyristor]</ref>
|-
| Aspect || Thyristor || IGBT
|-
| Definition || A four-layer semiconductor device with a P-N-P-N structure || An insulated gate bipolar transistor combining features from bipolar transistors and MOSFETs
|-
| Terminals || Anode, cathode, gate || Emitter, collector, gate
|-
| Layers || Four layers || Three layers
|-
| Junction || PNPN structure || NPN structure
|-
| Modes of operation || Reverse blocking, forward blocking, forward conducting || On-state, off-state
|-
| Design structure || Coupled transistors (PNP and NPN) || Combined bipolar and MOSFET features
|-
| Carrier source || Two sources of carriers || One source of carriers
|-
| Turn-on voltage || N/A || Low gate voltage required
|-
| Turn off loss || Higher || Lower
|-
| Plasma density || Higher || Lower
|-
| Operating frequency range || Suitable for line frequency, typically lower || Suitable for high frequencies, typically higher
|-
| Die Size and Paralleling Requirements || Larger die size, can be manufactured as monolithic devices up to 6" in diameter || Smaller die size, often paralleled in a package
|-
| Power range || Suitable for high power applications || Suitable for medium power applications
|-
| Control requirements || Requires gate current || Requires continuous gate voltage
|-
| Value for money || Cost-effective || Relatively higher cost
|-
| Control method || Pulse triggering || Gate voltage control
|-
| Switching speed || Slower || Faster
|-
| Current switching capability || High || Moderate
|-
| Control current || High current drive || Low current drive
|-
| Voltage capability || High voltage handling || Lower voltage handling
|-
| Power loss || Higher power dissipation || Lower power dissipation
|-
| Application || High voltage, robustness || High-speed switching, efficiency
|}


==History==
==History==
[[Image:IvsV IGBT.png|thumb|right|300px|Static characteristic of an IGBT]]


The [[metal–oxide–semiconductor field-effect transistor]] (MOSFET) was invented by [[Mohamed M. Atalla]] and [[Dawon Kahng]] at [[Bell Labs]] in 1959.<ref name="computerhistory">{{cite journal|url=https://www.computerhistory.org/siliconengine/metal-oxide-semiconductor-mos-transistor-demonstrated/|title=1960: Metal Oxide Semiconductor (MOS) Transistor Demonstrated|journal=The Silicon Engine: A Timeline of Semiconductors in Computers|publisher=[[Computer History Museum]] |access-date=August 31, 2019}}</ref> The basic IGBT mode of operation, where a pnp transistor is driven by a MOSFET, was first proposed by K. Yamagami and Y. Akagiri of [[Mitsubishi Electric]] in the Japanese [[patent]] S47-21739, which was filed in 1968.<ref>{{cite book |last1=Majumdar |first1=Gourab |last2=Takata |first2=Ikunori |title=Power Devices for Efficient Energy Conversion |date=2018 |publisher=[[CRC Press]] |isbn=9781351262316 |pages=144, 284, 318 |url=https://books.google.com/books?id=oSJWDwAAQBAJ}}</ref>
The IGBT is a semiconductor device with four alternating layers (P-N-P-N) that are controlled by a metal-oxide-semiconductor (MOS) gate structure without regenerative action.
This mode of operation was first proposed by Yamagami in his Japanese patent S47-21739, which was filed in 1968.<ref>[http://www4.ipdl.inpit.go.jp/Tokujitu/tjsogodben.ipdl?N0000=115 Yamagami's patent can be searched by inputting "Kind code" B, "Number" S47-21739 in the data base]</ref> This mode of operation was first experimentally discovered by [[B. Jayant Baliga]] in vertical device structures with a V-groove gate region and reported in the literature in 1979.<ref>B. J. Baliga, “Enhancement and Depletion Mode Vertical Channel MOS Gated Thyristors”, Electronics Letters, Vol. 15, pp. 645-647, September 27, 1979.</ref> The device structure was referred to as a ‘V-groove MOSFET device with the drain region replaced by a p-type Anode Region’ in this paper and subsequently as the insulated gate rectifier (IGR),<ref name="J. Baliga, pp. 264-267">B. J. Baliga, et al., “The Insulated Gate Rectifier”, IEEE International Electron Devices Meeting, Abstract 10.6, pp. 264-267, 1982.</ref> the insulated-gate transistor (IGT),<ref name="J. Baliga, pp. 452-454">B. J. Baliga, “Fast Switching Insulated Gate Transistors”, IEEE Electron Device Letters, Vol. EDL-4, pp. 452-454, 1983.</ref> the conductivity-modulated field-effect transistor (COMFET)<ref>J. P. Russell, et al., “The COMFET: A New High Conductance MOS Gated Device”, IEEE Electron Device Letters, Vol. EDL-4, pp. 63-65, 1983.</ref> and "bipolar-mode MOSFET".<ref>A.Nakagawa et al., High voltage bipolar-mode MOSFETs with high current capability", Ext. Abst. of SSDM, pp.309-312(1984)</ref>


Following the commercialization of [[power MOSFET]]s in the 1970s, [[B. Jayant Baliga]] submitted a patent disclosure at [[General Electric]] (GE) in 1977 describing a [[power semiconductor device]] with the IGBT mode of operation, including the MOS [[metal gate|gating]] of [[thyristors]], a four-layer [[VMOS]] (V-groove MOSFET) structure, and the use of MOS-gated structures to control a four-layer semiconductor device. He began [[Semiconductor device fabrication|fabricating]] the IGBT device with the assistance of Margaret Lazeri at GE in 1978 and successfully completed the project in 1979.<ref name="Baliga">{{cite book |last1=Baliga |first1=B. Jayant |title=The IGBT Device: Physics, Design and Applications of the Insulated Gate Bipolar Transistor |date=2015 |publisher=[[William Andrew (publisher)|William Andrew]] |isbn=9781455731534 |pages=xxviii, 5–12 |url=https://books.google.com/books?id=f091AgAAQBAJ}}</ref> The results of the experiments were reported in 1979.<ref>{{cite journal |last1=Baliga |first1=B. Jayant |author1-link=B. Jayant Baliga |title=Enhancement- and depletion-mode vertical-channel m.o.s. gated thyristors |journal=Electronics Letters |date=1979 |volume=15 |issue=20 |pages=645–647 |doi=10.1049/el:19790459 |bibcode=1979ElL....15..645J |issn=0013-5194}}</ref><ref name="powerelectronics">{{cite journal |title=Advances in Discrete Semiconductors March On |url=https://www.powerelectronics.com/content/advances-discrete-semiconductors-march |journal=Power Electronics Technology |publisher=[[Informa]] |pages=52–6 |access-date=31 July 2019 |date=September 2005 |archive-url=https://web.archive.org/web/20060322222716/http://powerelectronics.com/mag/509PET26.pdf |archive-date=22 March 2006 |url-status=live }}</ref> The device structure was referred to as a "V-groove MOSFET device with the drain region replaced by a p-type anode region" in this paper and subsequently as "the insulated-gate rectifier" (IGR),<ref name="J. Baliga, pp. 264–267">{{cite book |doi=10.1109/IEDM.1982.190269 |chapter=The insulated gate rectifier (IGR): A new power switching device |title=1982 International Electron Devices Meeting |year=1982 |last1=Baliga |first1=B.J. |last2=Adler |first2=M.S. |last3=Gray |first3=P.V. |last4=Love |first4=R.P. |last5=Zommer |first5=N. |pages=264–267 |s2cid=40672805 }}</ref> the insulated-gate transistor (IGT),<ref name="J. Baliga, pp. 452–454">{{cite journal |doi=10.1109/EDL.1983.25799 |title=Fast-switching insulated gate transistors |year=1983 |last1=Baliga |first1=B.J. |journal=[[IEEE Electron Device Letters]] |volume=4 |issue=12 |pages=452–454 |bibcode=1983IEDL....4..452B |s2cid=40454892 }}</ref> the conductivity-modulated field-effect transistor (COMFET)<ref name=COMFET/> and "bipolar-mode MOSFET".<ref>{{cite book |doi=10.7567/SSDM.1984.B-6-2 |chapter=High Voltage Bipolar-Mode MOSFET with High Current Capability |title=Extended Abstracts of the 1984 International Conference on Solid State Devices and Materials |year=1984 |last1=Nakagawa |first1=Akio |last2=Ohashi |first2=Hiromichi |last3=Tsukakoshi |first3=Tsuneo }}</ref>
Plummer found the same IGBT mode of operation in the four layer device (SCR) and he first filed a patent application for the device structure in 1978. USP No.4199774 was issued in 1980 and B1 Re33209<ref>[http://www.google.com/patents?id=I8EGAAAAEBAJ&dq=Re33209 B1 Re33209 is attached in the pdf file of Re 33209]</ref> was reissued in 1995 for the IGBT mode operation in the four layer device (SCR).


An MOS-controlled triac device was reported by B. W. Scharf and J. D. Plummer with their lateral four-layer device (SCR) in 1978.<ref>{{cite conference |last1=Scharf |first1=B. |last2=Plummer |first2=J. |title=A MOS-controlled triac device |conference=1978 IEEE International Solid-State Circuits Conference. Digest of Technical Papers |date=1978 |volume=XXI |pages=222–223 |doi=10.1109/ISSCC.1978.1155837|s2cid=11665546 }}</ref> Plummer filed a patent application for this mode of operation in the four-layer device (SCR) in 1978. USP No. 4199774 was issued in 1980, and B1 Re33209 was reissued in 1996.<ref>[https://patents.google.com/patent/USRE33209 B1 Re33209 is attached in the pdf file of Re 33209].</ref> The IGBT mode of operation in the four-layer device (SCR) switched to thyristor operation if the collector current exceeded the latch-up current, which is known as "holding current" in the well known theory of the thyristor.{{Citation needed|date=September 2019}}
Hans W. Becke and Carl F. Wheatley invented a similar device for which they filed a patent application in 1980, and which they referred to as "power MOSFET with an anode region".<ref>[http://www.google.com/patents?id=0ug5AAAAEBAJ&dq=4,364,073, U. S. Patent No. 4,364,073], Power MOSFET with an Anode Region, issued December 14, 1982 to Hans W. Becke and Carl F. Wheatley</ref> This patent has been called "the seminal patent of the Insulated Gate Bipolar Transistor."<ref>{{cite web | url = http://www.eng.umd.edu/ihof/wheatley.htm | title = C. Frank Wheatley, Jr., BSEE | work = Innovation Hall of Fame at A. James Clark School of Engineering}}</ref> The patent claimed "no thyristor action occurs under any device operating conditions." This substantially means the non-latch-up IGBT operation for the entire device operation range.


The development of IGBT was characterized by the efforts to completely suppress the thyristor operation or the latch-up in the four-layer device because the latch-up caused the fatal device failure. IGBTs had, thus, been established when the complete suppression of the latch-up of the parasitic thyristor was achieved as described in the following.
Devices capable of operating over an extended current range for use in applications were first reported by Baliga ''et al.'' in 1982.<ref name="J. Baliga, pp. 264-267"/> A similar paper was also submitted by J.P. Russel et al. to IEEE Electron Device Letter in 1982.<ref>J.P. Russel et al., "The COMFETs - a new high-conductance MOS-gate device," IEEE Electron Device Lett., vol. EDL-4, pp.63-65, 1983</ref> The applications for the device were initially regarded by the power electronics community to be severely restricted by its slow switching speed and latch-up of the parasitic thyristor structure inherent within the device. However, it was demonstrated by Baliga and also by A.M. Goodman et al. in 1983 that the switching speed could be adjusted over a broad range by using electron irradiation.<ref name="J. Baliga, pp. 452-454"/><ref>A. M. Goodman et al., "Improved COMFETs with fast switching speed and high current capability," IEEE International Electron Devices Meeting Technical Digest, pp.79-82,1983</ref> This was followed by demonstration of operation of the device at elevated temperatures by Baliga in 1985.<ref>B. J. Baliga, “Temperature Behavior of Insulated Gate Transistor Characteristics”, Solid State Electronics, Vol. 28, pp. 289-297, 1985.</ref> Successful efforts to suppress the latch-up of the parasitic thyristor and the scaling of the voltage rating of the devices at GE allowed the introduction of commercial devices in 1983,<ref>Product of the Year Award: “Insulated Gate Transistor” General Electric Company, Electronics Products, 1983.</ref> which could be utilized for a wide variety of applications.


Hans W. Becke and Carl F. Wheatley developed a similar device, for which they filed a patent application in 1980, and which they referred to as "power MOSFET with an anode region".<ref name="U. S. Patent No. 4,364,073">[https://patents.google.com/patent/US4364073 U. S. Patent No. 4,364,073], Power MOSFET with an Anode Region, issued December 14, 1982 to Hans W. Becke and Carl F. Wheatley.</ref><ref>{{cite web | url = http://www.eng.umd.edu/html/news/news_story.php?id=5778 | title = C. Frank Wheatley, Jr., BSEE | work = Innovation Hall of Fame at A. James Clark School of Engineering}}</ref> The patent claimed that "no thyristor action occurs under any device operating conditions". The device had an overall similar structure to Baliga's earlier IGBT device reported in 1979, as well as a similar title.<ref name="Baliga"/>
Complete suppression of the parasitic thyristor action and the resultant non-latch-up IGBT operation for the entire device operation range was achieved by A. Nakagawa et al. in 1984.<ref>A. Nakagawa et al., "Non-latch-up 1200V 75A bipolar-mode MOSFET with large ASO", IEEE International Electron Devices Meeting Technical Digest, pp.860-861,1984.</ref> The non-latch-up design concept was filed for US patents.<ref>A.Nakagawa, H. Ohashi, Y. Yamaguchi, K. Watanabe and T. Thukakoshi, “CONDUCTIVITY MODULATED MOSFET” [http://www.google.com/patents?id=D68DAAAAEBAJ&dq=6025622 US Patent No.6025622(Feb.15, 2000)], No.5086323 (Feb.4, 1992) and [http://www.google.com/patents?vid=USPAT4672407 No.4672407(Jun.9, 1987)]</ref> To test the lack of latchup, the prototype 1200V IGBTs were directly connected without any loads across a 600V constant voltage source and were switched on for 25 microseconds. The entire 600V was dropped across the device and a large short circuit current flowed. The devices successfully withstood this severe condition. This was the first demonstration of so-called "short-circuit-withstanding-capability" in IGBTs. Non-latch-up IGBT operation was ensured, for the first time, for the entire device operation range.<ref name="A. Nakagawa pp.150-153">A. Nakagawa et al., "Experimental and numerical study of non-latch-up bipolar-mode MOSFET characteristics" IEEE International Electron Devices Meeting Technical Digest, pp.150-153, 1985</ref> In this sense, the non-latch-up IGBT proposed by Hans W. Becke and Carl F. Wheatley was realized by A. Nakagawa et al. in 1984. Products of non-latch-up IGBTs were first commercialized by Toshiba in 1985.


A. Nakagawa et al. invented the device design concept of non-latch-up IGBTs in 1984.<ref name="Nakagawa Ohashi Kurata et al 1984">{{cite book |doi=10.1109/IEDM.1984.190866 |chapter=Non-latch-up 1200V 75A bipolar-mode MOSFET with large ASO |title=1984 International Electron Devices Meeting |year=1984 |last1=Nakagawa |first1=A. |last2=Ohashi |first2=H. |last3=Kurata |first3=M. |last4=Yamaguchi |first4=H. |last5=Watanabe |first5=K. |pages=860–861 |s2cid=12136665 }}</ref> The invention<ref>A. Nakagawa, H. Ohashi, Y. Yamaguchi, K. Watanabe and T. Thukakoshi, "Conductivity modulated MOSFET" [https://patents.google.com/patent/US6025622 US Patent No. 6025622 (Feb. 15, 2000)], No. 5086323 (Feb. 4, 1992) and [https://patents.google.com/patent/US4672407 No. 4672407 (Jun. 9, 1987)].</ref> is characterized by the device design setting the device saturation current below the latch-up current, which triggers the parasitic thyristor. This invention realized complete suppression of the parasitic thyristor action, for the first time, because the maximal collector current was limited by the saturation current and never exceeded the latch-up current.
Once the non-latch-up capability was achieved in IGBTs, it was found that IGBTs exhibited very rugged and a very large [[safe operating area]]. It was demonstrated that the product of the operating current density and the collector voltage exceeded the theoretical limit of bipolar transistors, 2x10<sup>5</sup>W/cm<sup>2</sup>, and reached 5x10<sup>5</sup>W/cm<sup>2</sup>.<ref name="A.Nakagawa 1987"/><ref name="A. Nakagawa pp.150-153"/>


In the early development stage of IGBT, all the researchers tried to increase the latch-up current itself in order to suppress the latch-up of the parasitic thyristor. However, all these efforts failed because IGBT could conduct enormously large current. Successful suppression of the latch-up was made possible by limiting the maximal collector current, which IGBT could conduct, below the latch-up current by controlling/reducing the saturation current of the inherent MOSFET. This was the concept of non-latch-up IGBT. “Becke’s device” was made possible by the non-latch-up IGBT.
==Device structure==


The IGBT is characterized by its ability to simultaneously handle a high voltage and a large current. The product of the voltage and the current density that the IGBT can handle reached more than 5{{E|5}} W/cm<sup>2</sup>,<ref name="A.Nakagawa 1987"/><ref name="A. Nakagawa pp. 150–153"/> which far exceeded the value, 2{{E|5}} W/cm<sup>2</sup>, of existing power devices such as bipolar transistors and power MOSFETs. This is a consequence of the large [[safe operating area]] of the IGBT. The IGBT is the most rugged and the strongest power device yet developed, affording ease of use and so displacing bipolar transistors and even [[gate turn-off thyristor]]s (GTOs).
An IGBT cell is constructed similarly to a n-channel vertical construction [[power MOSFET]] except the n+ drain is replaced with a p+ collector layer, thus forming a vertical PNP [[bipolar junction transistor]].
This excellent feature of the IGBT had suddenly emerged when the non-latch-up IGBT was established in 1984 by solving the problem of so-called “latch-up,” which is the main cause of device destruction or device failure. Before that, the developed devices were very weak and were easy to be destroyed because of “latch-up.”


===Practical devices===
[[Image:IGBT Cross Section.jpg|right|300px|thumb|Cross section of a typical IGBT showing internal connection of MOSFET and Bipolar Device]]
Practical devices capable of operating over an extended current range were first reported by [[B. Jayant Baliga]] et al. in 1982.<ref name="J. Baliga, pp. 264–267"/> The first experimental demonstration of a practical discrete vertical IGBT device was reported by Baliga at the [[IEEE International Electron Devices Meeting]] (IEDM) that year.<ref>{{cite journal |last1=Shenai |first1=K. |title=The Invention and Demonstration of the IGBT [A Look Back] |journal=IEEE Power Electronics Magazine |date=2015 |volume=2 |issue=2 |pages=12–16 |doi=10.1109/MPEL.2015.2421751 |s2cid=37855728 |issn=2329-9207}}</ref><ref name="J. Baliga, pp. 264–267"/> [[General Electric]] commercialized Baliga's IGBT device the same year.<ref name="Baliga"/> Baliga was inducted into the [[National Inventors Hall of Fame]] for the invention of the IGBT.<ref name="NIHF">{{cite web |title=NIHF Inductee Bantval Jayant Baliga Invented IGBT Technology |url=https://www.invent.org/inductees/bantval-jayant-baliga |website=[[National Inventors Hall of Fame]] |access-date=17 August 2019}}</ref>


A similar paper was also submitted by J. P. Russel et al. to IEEE Electron Device Letter in 1982.<ref name=COMFET>{{cite journal |doi=10.1109/EDL.1983.25649 |title=The COMFET—A new high conductance MOS-gated device |year=1983 |last1=Russell |first1=J.P. |last2=Goodman |first2=A.M. |last3=Goodman |first3=L.A. |last4=Neilson |first4=J.M. |journal=IEEE Electron Device Letters |volume=4 |issue=3 |pages=63–65 |bibcode=1983IEDL....4...63R |s2cid=37850113 }}</ref> The applications for the device were initially regarded by the [[power electronics]] community to be severely restricted by its slow switching speed and latch-up of the parasitic thyristor structure inherent within the device. However, it was demonstrated by Baliga and also by A. M. Goodman et al. in 1983 that the switching speed could be adjusted over a broad range by using [[electron irradiation]].<ref name="J. Baliga, pp. 452–454"/><ref>{{cite book |doi=10.1109/IEDM.1983.190445 |chapter=Improved COMFETs with fast switching speed and high-current capability |title=1983 International Electron Devices Meeting |year=1983 |last1=Goodman |first1=A.M. |last2=Russell |first2=J.P. |last3=Goodman |first3=L.A. |last4=Nuese |first4=C.J. |last5=Neilson |first5=J.M. |pages=79–82 |s2cid=2210870 }}</ref> This was followed by demonstration of operation of the device at elevated temperatures by Baliga in 1985.<ref>{{cite journal|title=Temperature behavior of insulated gate transistor characteristics|journal=Solid-State Electronics|volume=28|issue=3|pages=289–297|doi=10.1016/0038-1101(85)90009-7|year=1985|last1=Baliga|first1=B.Jayant|bibcode=1985SSEle..28..289B}}</ref> Successful efforts to suppress the latch-up of the parasitic thyristor and the scaling of the voltage rating of the devices at GE allowed the introduction of commercial devices in 1983,<ref>Product of the Year Award: "Insulated Gate Transistor", General Electric Company, Electronics Products, 1983.</ref> which could be utilized for a wide variety of applications. The electrical characteristics of GE's device, IGT D94FQ/FR4, were reported in detail by Marvin W. Smith in the proceedings of PCI April 1984.<ref>Marvin W. Smith, "APPLICATIONS OF INSULATED GATE TRANSISTORS" PCI April 1984 PROCEEDINGS, pp. 121-131, 1984 (Archived PDF [https://archive1982.web.fc2.com/Application1984.pdf])</ref> Marvin W. Smith showed in Fig.12 of the proceedings that turn-off above 10 amperes for gate resistance of 5kOhm and above 5 amperes for gate resistance of 1kOhm was limited by switching safe operating area although IGT D94FQ/FR4 was able to conduct 40 amperes of collector current. Marvin W. Smith also stated that the switching safe operating area was limited by the latch-up of the parasitic thyristor.
This additional p+ region creates a cascade connection of a PNP bipolar junction transistor with the surface n-channel [[MOSFET]]. This connection results in a significantly lower forward voltage drop compared to a conventional MOSFET in higher blocking voltage rated devices. As the blocking voltage rating of both MOSFET and IGBT devices increases, the depth of the n- drift region must increase and the doping must decrease, resulting in roughly square relationship increase in forward conduction loss compared to blocking voltage capability of the device. By injecting minority carriers (holes) from the collector p+ region into the n- drift region during forward conduction, the resistance of the n- drift region is considerably reduced. However, this resultant reduction in on-state forward voltage comes with several penalties:


Complete suppression of the parasitic thyristor action and the resultant non-latch-up IGBT operation for the entire device operation range was achieved by A. Nakagawa et al. in 1984.<ref name="Nakagawa Ohashi Kurata et al 1984"/> The non-latch-up design concept was filed for US patents.<ref>A.Nakagawa, H. Ohashi, Y. Yamaguchi, K. Watanabe and T. Thukakoshi, "Conductivity modulated MOSFET" [https://patents.google.com/patent/US6025622 US Patent No.6025622(Feb.15, 2000)], No.5086323 (Feb.4, 1992) and [https://patents.google.com/patent/US4672407 No.4672407(Jun.9, 1987)]</ref> To test the lack of latch-up, the prototype 1200 V IGBTs were directly connected without any loads across a 600 V constant voltage source and were switched on for 25 microseconds. The entire 600 V was dropped across the device and a large short circuit current flowed. The devices successfully withstood this severe condition. This was the first demonstration of so-called "short-circuit-withstanding-capability" in IGBTs. Non-latch-up IGBT operation was ensured, for the first time, for the entire device operation range.<ref name="A. Nakagawa pp. 150–153">{{cite book |doi=10.1109/IEDM.1985.190916 |chapter=Experimental and numerical study of non-latch-up bipolar-mode MOSFET characteristics |title=1985 International Electron Devices Meeting |year=1985 |last1=Nakagawa |first1=A. |last2=Yamaguchi |first2=Y. |last3=Watanabe |first3=K. |last4=Ohashi |first4=H. |last5=Kurata |first5=M. |pages=150–153 |s2cid=24346402 }}</ref> In this sense, the non-latch-up IGBT proposed by Hans W. Becke and Carl F. Wheatley was realized by A. Nakagawa et al. in 1984. Products of non-latch-up IGBTs were first commercialized by Toshiba in 1985. This was the real birth of the present IGBT.
* The additional PN junction blocks reverse current flow. This means that unlike a MOSFET, IGBTs cannot conduct in the reverse direction. In bridge circuits where reverse current flow is needed an additional diode (called a [[flyback diode|freewheeling diode]]) is placed in parallel with the IGBT to conduct current in the opposite direction. The penalty isn't as severe as first assumed though, because at the higher voltages where IGBT usage dominates, discrete diodes are of significantly higher performance than the body diode of a MOSFET.
* The reverse bias rating of the N- drift region to collector P+ diode is usually only of 10's of volts, so if the circuit application applies a reverse voltage to the IGBT, an additional series diode must be used.
* The minority carriers injected into the n- drift region take time to enter and exit or recombine at turn on and turn off. This results in longer switching time and hence higher switching loss compared to a power MOSFET.
* The device turns off slowly due to long recombination times, which makes it unsuitable for hard turn-off applications (such as [[Boost converter|boost]] or [[Flyback converter|flyback]] [[Power converter|power converters]].
* The additional PN junction adds a diode-like voltage drop to the device. At lower blocking voltage ratings, this additional drop means that an IGBT would have a higher on-state voltage drop. As the voltage rating of the device increases, the advantage of the reduced N- drift region resistance overcomes the penalty of this diode drop and the overall on-state voltage drop is lower (the crossover is around 400 V blocking rating). Thus IGBTs are rarely used where the blocking voltage requirement is below 600 V.


Once the non-latch-up capability was achieved in IGBTs, it was found that IGBTs exhibited very rugged and a very large [[safe operating area]]. It was demonstrated that the product of the operating current density and the collector voltage exceeded the theoretical limit of bipolar transistors, 2{{E|5}} W/cm<sup>2</sup>, and reached 5{{E|5}} W/cm<sup>2</sup>.<ref name="A.Nakagawa 1987"/><ref name="A. Nakagawa pp. 150–153"/>
==IGBT models==
Rather than using a [[semiconductor device physics|device physics]]-based model, [[SPICE]] simulates IGBTs using Macromodels, a method that combines an ensemble of components such as [[field-effect transistor|FET]]s and [[bipolar junction transistor|BJT]]s in a [[Darlington transistor|Darlington configuration]]. {{Citation needed|date=September 2007}} An alternative physics-based model is the Hefner model, introduced by Allen Hefner of the [[NIST]]. It is a fairly complex model that has shown very good results. Hefner's model is described in a 1988 paper and was later extended to a thermo-electrical model and a version using [[SABER]].<ref>A. R. Hefner, Jr., et al., “An Experimentally Verified IGBT Model Implemented in the Saber Circuit Simulator”, IEEE Transactions on Power Electronics, Vol 9, No 5, pp. 532-542, 1994.</ref>


The insulating material is typically made of solid polymers which have issues with degradation. There are developments that use an [[ion gel]] to improve manufacturing and reduce the voltage required.<ref>{{cite web|url=http://www.license.umn.edu/Products/Ion-Gel-as-a-Gate-Insulator-in-Field-Effect-Transistors__Z07062.aspx |title=Ion Gel as a Gate Insulator in Field Effect Transistors |url-status=dead |archive-url=https://web.archive.org/web/20111114011218/http://www.license.umn.edu/Products/Ion-Gel-as-a-Gate-Insulator-in-Field-Effect-Transistors__Z07062.aspx |archive-date=2011-11-14 }}</ref>
== Usage ==

{| border=0
The first-generation IGBTs of the 1980s and early 1990s were prone to failure through effects such as [[latchup]] (in which the device will not turn off as long as current is flowing) and [[secondary breakdown]] (in which a localized hotspot in the device goes into [[thermal runaway]] and burns the device out at high currents). Second-generation devices were much improved. The current third-generation IGBTs are even better, with speed rivaling [[power MOSFET]]s, and excellent ruggedness and tolerance of overloads.<ref name="A.Nakagawa 1987">{{cite journal |doi=10.1109/T-ED.1987.22929 |title=Safe operating area for 1200-V nonlatchup bipolar-mode MOSFET's |year=1987 |last1=Nakagawa |first1=A. |last2=Yamaguchi |first2=Y. |last3=Watanabe |first3=K. |last4=Ohashi |first4=H. |journal=IEEE Transactions on Electron Devices |volume=34 |issue=2 |pages=351–355 |bibcode=1987ITED...34..351N |s2cid=25472355 }}</ref> Extremely high pulse ratings of second and third-generation devices also make them useful for generating large power pulses in areas including [[particle physics|particle]] and [[plasma physics]], where they are starting to supersede older devices such as [[thyratron]]s and [[triggered spark gap]]s. High pulse ratings and low prices on the surplus market also make them attractive to the high-voltage hobbyists for controlling large amounts of power to drive devices such as solid-state [[Tesla coil]]s and [[coilgun]]s.
| valign=top | [[Image:IGBT 3300V 1200A Mitsubishi.jpg|thumb|IGBT-Module (IGBTs and free wheeling diodes) with a rated current of {{nowrap|1200 A}} and a maximum voltage of {{nowrap|3300 V}}]] || [[Image:IGBT 2441.JPG|thumb|Opened IGBT module with four IGBTs (half [[H-bridge]]) each rated for {{nowrap|400 A}} {{nowrap|600 V}}]] || [[Image:igbt.jpg|thumb|Small IGBT module, rated up to {{nowrap|30 A}}, up to {{nowrap|900 V}}]]

|}
===Patent issues===
The device proposed by J. D. Plummer in 1978 (US Patent Re.33209) is the same structure as a thyristor with a MOS gate. Plummer discovered and proposed that the device can be used as a transistor although the device operates as a thyristor in higher current density level.<ref>{{cite book |doi=10.1109/ISSCC.1978.1155837 |chapter=A MOS-controlled triac device |title=1978 IEEE International Solid-State Circuits Conference. Digest of Technical Papers |year=1978 |last1=Scharf |first1=B. |last2=Plummer |first2=J. |pages=222–223 |s2cid=11665546 }}</ref> The device proposed by J. D. Plummer is referred here as “Plummer’s device.” On the other hand, Hans W. Becke proposed, in 1980, another device in which the thyristor action is eliminated under any device operating conditions although the basic device structure is the same as that proposed by J. D. Plummer. The device developed by Hans W. Becke is referred here as “Becke’s device” and is described in US Patent 4364073. The difference between “Plummer’s device” and “Becke’s device” is that “Plummer’s device” has the mode of thyristor action in its operation range and “Becke’s device” never has the mode of thyristor action in its entire operation range. This is a critical point, because the thyristor action is the same as so-called “latch-up.” “Latch-up” is the main cause of fatal device failure. Thus, theoretically, “Plummer’s device” never realizes a rugged or strong power device which has a large safe operating area. The large safe operating area can be achieved only after “latch-up” is completely suppressed and eliminated in the entire device operation range.{{Citation needed|date=July 2019}} However, the Becke's patent (US Patent 4364073) did not disclose any measures to realize actual devices.

Despite Becke's patent describing a similar structure to Baliga's earlier IGBT device,<ref name="Baliga"/> several IGBT manufacturers paid the license fee of Becke's patent.<ref name="U. S. Patent No. 4,364,073"/> [[Toshiba]] commercialized “non-latch-up IGBT” in 1985. Stanford University insisted in 1991 that Toshiba's device infringed US Patent RE33209 of “Plummer’s device.” Toshiba answered that “non-latch-up IGBTs” never latched up in the entire device operation range and thus did not infringe US Patent RE33209 of “Plummer’s patent.” Stanford University never responded after Nov. 1992. Toshiba purchased the license of “Becke’s patent” but never paid any license fee for “Plummer’s device.” Other IGBT manufacturers also paid the license fee for Becke's patent.

==Applications==
{{Main|List of MOSFET applications#Insulated-gate bipolar transistor (IGBT)}}
{{See also|LDMOS#Applications|Power MOSFET|RF CMOS#Applications}}

{{As of|2010}}, the IGBT is the second most widely used [[power transistor]], after the power MOSFET. The IGBT accounts for 27% of the power transistor market, second only to the power MOSFET (53%), and ahead of the [[RF amplifier]] (11%) and [[bipolar junction transistor]] (9%).<ref>{{cite news |title=Power Transistor Market Will Cross $13.0 Billion in 2011 |url=http://www.icinsights.com/news/bulletins/Power-Transistor-Market-Will-Cross-130-Billion-In-2011/ |access-date=15 October 2019 |work=IC Insights |date=June 21, 2011}}</ref> The IGBT is widely used in [[consumer electronics]], [[industrial technology]], the [[energy sector]], [[aerospace]] electronic devices, and [[transportation]].

==Advantages==
The IGBT combines the simple gate-drive characteristics of [[power MOSFET]]s with the high-current and low-saturation-voltage capability of [[Bipolar junction transistor|bipolar transistor]]s. The IGBT combines an isolated-gate [[field-effect transistor|FET]] for the control input and a bipolar power [[transistor]] as a switch in a single device. The IGBT is used in medium to high-power applications like [[switched-mode power supplies]], [[traction motor]] control and [[induction heating]]. Large IGBT modules typically consist of many devices in parallel and can have very high current-handling capabilities in the order of hundreds of [[ampere]]s with blocking voltages of {{nowrap|6500 [[volts|V]]}}. These IGBTs can control loads of hundreds of [[kilowatts]].

==Comparison with power MOSFETs==
An IGBT features a significantly lower forward voltage drop compared to a conventional MOSFET in higher blocking voltage rated devices, although MOSFETS exhibit much lower forward voltage at lower current densities due to the absence of a diode Vf in the IGBT's output BJT. As the blocking voltage rating of both MOSFET and IGBT devices increases, the depth of the n- drift region must increase and the doping must decrease, resulting in roughly square relationship decrease in forward conduction versus blocking voltage capability of the device. By injecting minority carriers (holes) from the collector p+ region into the n- drift region during forward conduction, the resistance of the n- drift region is considerably reduced. However, this resultant reduction in on-state forward voltage comes with several penalties:

* The additional PN junction blocks reverse current flow. This means that unlike a MOSFET, IGBTs cannot conduct in the reverse direction. In bridge circuits, where reverse current flow is needed, an additional diode (called a [[flyback diode|freewheeling diode]]) is placed in anti-parallel with the IGBT to conduct current in the opposite direction. The penalty isn't overly severe because at higher voltages, where IGBT usage dominates, discrete diodes have a significantly higher performance than the body diode of a MOSFET.
* The reverse bias rating of the N-drift region to collector P+ diode is usually only of tens of volts, so if the circuit application applies a reverse voltage to the IGBT, an additional series diode must be used.
* The minority carriers injected into the N-drift region take time to enter and exit or recombine at turn-on and turn-off. This results in longer switching times, and hence higher {{ill|switching loss|de|Schaltverluste}} compared to a power MOSFET.
* The on-state forward voltage drop in IGBTs behaves very differently from power MOSFETS. The MOSFET voltage drop can be modeled as a resistance, with the voltage drop proportional to current. By contrast, the IGBT has a diode-like voltage drop (typically of the order of 2V) increasing only with the [[natural logarithm|log]] of the current. Additionally, MOSFET resistance is typically lower for smaller blocking voltages, so the choice between IGBTs and power MOSFETS will depend on both the blocking voltage and current involved in a particular application.

In general, high voltage, high current and lower frequencies favor the IGBT while low voltage, medium current and high switching frequencies are the domain of the MOSFET.

==Modeling==
Circuits with IGBTs can be developed and [[computer modeling|modeled]] with various [[electronic circuit simulation|circuit simulating]] computer programs such as [[SPICE]], [[Saber (software)|Saber]], and other programs. To simulate an IGBT circuit, the device (and other devices in the circuit) must have a model which predicts or simulates the device's response to various voltages and currents on their electrical terminals. For more precise simulations the effect of temperature on various parts of the IGBT may be included with the simulation.
Two common methods of modeling are available: [[semiconductor device physics|device physics]]-based model, [[equivalent circuit]]s or macromodels. [[SPICE]] simulates IGBTs using a macromodel that combines an ensemble of components like [[field-effect transistor|FET]]s and [[bipolar junction transistor|BJT]]s in a [[Darlington transistor|Darlington configuration]].{{Citation needed|date=September 2007}} An alternative physics-based model is the Hefner model, introduced by Allen Hefner of the [[National Institute of Standards and Technology]]. Hefner's model is fairly complex but has shown good results. Hefner's model is described in a 1988 paper and was later extended to a thermo-electrical model which include the IGBT's response to internal heating. This model has been added to a version of the [[Saber (software)|Saber]] simulation software.<ref>{{cite journal |last1=Hefner |first1=A.R. |last2=Diebolt |first2=D.M. |title=An experimentally verified IGBT model implemented in the Saber circuit simulator |journal=IEEE Transactions on Power Electronics |date=September 1994 |volume=9 |issue=5 |pages=532–542 |doi=10.1109/63.321038 |bibcode=1994ITPE....9..532H |s2cid=53487037 }}</ref>

==IGBT failure mechanisms==
The failure mechanisms of IGBTs includes overstress (O) and wearout(wo) separately.

The wearout failures mainly include bias temperature instability (BTI), hot carrier injection (HCI), time-dependent dielectric breakdown (TDDB), electromigration (ECM), solder fatigue, material reconstruction, corrosion. The overstress failures mainly include electrostatic discharge (ESD), latch-up, avalanche, secondary breakdown, wire-bond liftoff and burnout.<ref>{{cite journal |last1=Patil |first1=N. |last2=Celaya |first2=J. |last3=Das |first3=D. |last4=Goebel |first4=K. |last5=Pecht |first5=M. |title=Precursor Parameter Identification for Insulated Gate Bipolar Transistor (IGBT) Prognostics |journal=IEEE Transactions on Reliability |date=June 2009 |volume=58 |issue=2 |pages=271–276 |doi=10.1109/TR.2009.2020134 |s2cid=206772637 }}</ref>

== IGBT modules ==

<gallery mode="packed">
Image:IGBT 3300V 1200A Mitsubishi.jpg | IGBT module (IGBTs and [[flyback diode|freewheeling diodes]]) with a rated current of {{nowrap|1200 A}} and a maximum voltage of {{nowrap|3300 V}}
Image:IGBT 2441.JPG | Opened IGBT module with four IGBTs (half of [[H-bridge]]) rated for {{nowrap|400 A}} {{nowrap|600 V}}
File:Infineon IGBT-Modul.jpg | Infineon IGBT Module rated for {{nowrap|450 A}} {{nowrap|1200 V}}
Image:igbt.jpg | Small IGBT module, rated up to {{nowrap|30 A}}, up to {{nowrap|900 V}}
File:CM600DU-24NFH.jpg | Detail of the inside of a Mitsubishi Electric CM600DU-24NFH IGBT module rated for {{nowrap|600 A}} {{nowrap|1200 V}}, showing the IGBT dies and freewheeling diodes
</gallery>


==See also==
==See also==
Line 57: Line 200:
* [[Bipolar junction transistor]]
* [[Bipolar junction transistor]]
* [[Bootstrapping (electronics)|Bootstrapping]]
* [[Bootstrapping (electronics)|Bootstrapping]]
* [[Current injection technique]]
* [[FGMOS]]
* [[Floating-gate MOSFET]]
* [[JFET|Junction-gate field-effect transistor]]
* [[MOSFET]]
* [[Power electronics]]
* [[Power electronics]]
* [[Power MOSFET]]
* [[Power MOSFET]]
* [[Power semiconductor device]]
* [[Solar inverter]]


==References==
==References==
{{Reflist}}
{{Reflist}}


== Literature ==
== ==
* {{cite book |last1=Wintrich |first1= Arendt |last2= Nicolai |first2= Ulrich |last3= Tursky |first3= Werner |last4= Reimann |first4= Tobias |title= Application Manual Power Semiconductors |url= https://www.semikron.com/service-support/application-manual.html |format= PDF-Version |edition= 2nd Revised |year= 2015 |publisher=ISLE Verlag |location=Germany |isbn= 978-3-938843-83-3 |editor-last= Semikron |editor-link= Semikron |access-date= 2019-02-17}}
* Dr. Ulrich Nicolai, Dr. Tobias Reimann, Prof. Jürgen Petzoldt, Josef Lutz: ''Application Manual IGBT and MOSFET Power Modules'', 1. Edition, ISLE Verlag, 1998, ISBN 3-932633-24-5 [http://www.semikron.com/skcompub/en/application_manual-193.htm PDF-Version]


==External links==
==External links==
{{Commons category|Insulated_gate_bipolar_transistors|IGBT}}
{{Commons category|Insulated_gate_bipolar_transistors|IGBT}}
* [http://eng.umd.edu/ihof/inductees/wheatley.html About the inventors]
* [http://www.elec.gla.ac.uk/groups/dev_mod/papers/igbt/igbt.html Device physics information] from the [[University of Glasgow]]
* [http://www.elec.gla.ac.uk/groups/dev_mod/papers/igbt/igbt.html Device physics information] from the [[University of Glasgow]]
* [http://www.intusoft.com/articles/Igbt.pdf Spice model for IGBT]
* [http://www.intusoft.com/articles/Igbt.pdf Spice model for IGBT]
* [https://web.archive.org/web/20130608203946/http://www.powerguru.org/igbt-driver-calculation/ IGBT driver calculation]
*[http://www.ixyspower.com/images/technical_support/Application%20Notes%20By%20Topic/IGBTs/IXYS_IGBT_Basic_I.pdf Insulated Gate Bipolar Transistor (IGBT) Basic] Ixys Corporation Application note IXAN0063

* [http://www.powersystemscooling.com/ Cooling IGBT Modules]
{{Electronic component}}
* [http://www.pwrx.com/Library.aspx?s=1^0|2^0|3^0|&k=using%20igbt Using IGBT Modules - Powerex]
{{Authority control}}
* [http://www.power-io.com/products/hdd.htm IGBT and control input circuit for PWM applications]


[[Category:Transistor types]]
[[Category:Transistor types]]
[[Category:Solid state switches]]
[[Category:Solid state switches]]
[[Category:Power electronics]]
[[Category:Power electronics]]
[[Category:Bipolar transistors]]
{{Link GA|fr}}
[[Category:MOSFETs]]

[[Category:Indian inventions]]
[[ca:Transistor IGBT]]
[[Category:Japanese inventions]]
[[cs:IGBT]]
[[da:Insulated gate bipolar transistor]]
[[de:Bipolartransistor mit isolierter Gate-Elektrode]]
[[et:Isoleeritud paisuga bipolaartransistor]]
[[es:Transistor IGBT]]
[[fr:Transistor bipolaire à grille isolée]]
[[ko:절연 게이트 양극성 트랜지스터]]
[[hi:इंसुलेटेड गेट बाईपोलर ट्रांजिस्टर]]
[[id:Transistor dwikutub gerbang-terisolasi]]
[[it:Insulated Gate Bipolar Transistor]]
[[he:טרנזיסטור IGBT]]
[[nl:Insulated-gate bipolar transistor]]
[[ja:絶縁ゲートバイポーラトランジスタ]]
[[pl:IGBT]]
[[pt:IGBT]]
[[ru:IGBT]]
[[sk:Bipolárny tranzistor s izolovaným hradlom]]
[[sv:IGBT]]
[[tr:IGBT]]
[[uk:IGBT-транзистор]]
[[vi:IGBT]]
[[zh:絕緣柵雙極晶體管]]

Latest revision as of 19:10, 20 June 2024

Insulated-gate bipolar transistor
IGBT module (IGBTs and freewheeling diodes) with a rated current of 1200 A and a maximum voltage of 3300 V
Working principleSemiconductor
Invented1959
Electronic symbol

IGBT schematic symbol

An insulated-gate bipolar transistor (IGBT) is a three-terminal power semiconductor device primarily forming an electronic switch. It was developed to combine high efficiency with fast switching. It consists of four alternating layers (P–N–P–N) that are controlled by a metal–oxide–semiconductor (MOS) gate structure.

Although the structure of the IGBT is topologically similar to a thyristor with a "MOS" gate (MOS-gate thyristor), the thyristor action is completely suppressed, and only the transistor action is permitted in the entire device operation range. It is used in switching power supplies in high-power applications: variable-frequency drives (VFDs) for motor control in electric cars, trains, variable-speed refrigerators, and air conditioners, as well as lamp ballasts, arc-welding machines, uninterruptible power supply systems (UPS), and induction stoves.

Since it is designed to turn on and off rapidly, the IGBT can synthesize complex waveforms with pulse-width modulation and low-pass filters, thus it is also used in switching amplifiers in sound systems and industrial control systems. In switching applications modern devices feature pulse repetition rates well into the ultrasonic-range frequencies, which are at least ten times higher than audio frequencies handled by the device when used as an analog audio amplifier. As of 2010, the IGBT was the second most widely used power transistor, after the power MOSFET.[citation needed]

IGBT comparison table[1]
Device characteristic Power BJT Power MOSFET IGBT
Voltage rating High <1 kV High <1 kV Very high >1 kV
Current rating High <500 A Low <200 A High >500 A
Input drive Current ratio
hFE ~ 20–200
Voltage
VGS ~ 3–10 V
Voltage
VGE ~ 4–8 V
Input impedance Low High High
Output impedance Low Medium Low
Switching speed Slow (μs) Fast (ns) Medium
Cost Low Medium High

Device structure

[edit]
Cross-section of a typical IGBT showing internal connection of MOSFET and bipolar device

An IGBT cell is constructed similarly to an n-channel vertical-construction power MOSFET, except the n+ drain is replaced with a p+ collector layer, thus forming a vertical PNP bipolar junction transistor. This additional p+ region creates a cascade connection of a PNP bipolar junction transistor with the surface n-channel MOSFET.

Difference between Thyristor and IGBT

[edit]
Difference Between Thyristor and IGBT[2]
Aspect Thyristor IGBT
Definition A four-layer semiconductor device with a P-N-P-N structure An insulated gate bipolar transistor combining features from bipolar transistors and MOSFETs
Terminals Anode, cathode, gate Emitter, collector, gate
Layers Four layers Three layers
Junction PNPN structure NPN structure
Modes of operation Reverse blocking, forward blocking, forward conducting On-state, off-state
Design structure Coupled transistors (PNP and NPN) Combined bipolar and MOSFET features
Carrier source Two sources of carriers One source of carriers
Turn-on voltage N/A Low gate voltage required
Turn off loss Higher Lower
Plasma density Higher Lower
Operating frequency range Suitable for line frequency, typically lower Suitable for high frequencies, typically higher
Die Size and Paralleling Requirements Larger die size, can be manufactured as monolithic devices up to 6" in diameter Smaller die size, often paralleled in a package
Power range Suitable for high power applications Suitable for medium power applications
Control requirements Requires gate current Requires continuous gate voltage
Value for money Cost-effective Relatively higher cost
Control method Pulse triggering Gate voltage control
Switching speed Slower Faster
Current switching capability High Moderate
Control current High current drive Low current drive
Voltage capability High voltage handling Lower voltage handling
Power loss Higher power dissipation Lower power dissipation
Application High voltage, robustness High-speed switching, efficiency

History

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Static characteristic of an IGBT

The metal–oxide–semiconductor field-effect transistor (MOSFET) was invented by Mohamed M. Atalla and Dawon Kahng at Bell Labs in 1959.[3] The basic IGBT mode of operation, where a pnp transistor is driven by a MOSFET, was first proposed by K. Yamagami and Y. Akagiri of Mitsubishi Electric in the Japanese patent S47-21739, which was filed in 1968.[4]

Following the commercialization of power MOSFETs in the 1970s, B. Jayant Baliga submitted a patent disclosure at General Electric (GE) in 1977 describing a power semiconductor device with the IGBT mode of operation, including the MOS gating of thyristors, a four-layer VMOS (V-groove MOSFET) structure, and the use of MOS-gated structures to control a four-layer semiconductor device. He began fabricating the IGBT device with the assistance of Margaret Lazeri at GE in 1978 and successfully completed the project in 1979.[5] The results of the experiments were reported in 1979.[6][7] The device structure was referred to as a "V-groove MOSFET device with the drain region replaced by a p-type anode region" in this paper and subsequently as "the insulated-gate rectifier" (IGR),[8] the insulated-gate transistor (IGT),[9] the conductivity-modulated field-effect transistor (COMFET)[10] and "bipolar-mode MOSFET".[11]

An MOS-controlled triac device was reported by B. W. Scharf and J. D. Plummer with their lateral four-layer device (SCR) in 1978.[12] Plummer filed a patent application for this mode of operation in the four-layer device (SCR) in 1978. USP No. 4199774 was issued in 1980, and B1 Re33209 was reissued in 1996.[13] The IGBT mode of operation in the four-layer device (SCR) switched to thyristor operation if the collector current exceeded the latch-up current, which is known as "holding current" in the well known theory of the thyristor.[citation needed]

The development of IGBT was characterized by the efforts to completely suppress the thyristor operation or the latch-up in the four-layer device because the latch-up caused the fatal device failure. IGBTs had, thus, been established when the complete suppression of the latch-up of the parasitic thyristor was achieved as described in the following.

Hans W. Becke and Carl F. Wheatley developed a similar device, for which they filed a patent application in 1980, and which they referred to as "power MOSFET with an anode region".[14][15] The patent claimed that "no thyristor action occurs under any device operating conditions". The device had an overall similar structure to Baliga's earlier IGBT device reported in 1979, as well as a similar title.[5]

A. Nakagawa et al. invented the device design concept of non-latch-up IGBTs in 1984.[16] The invention[17] is characterized by the device design setting the device saturation current below the latch-up current, which triggers the parasitic thyristor. This invention realized complete suppression of the parasitic thyristor action, for the first time, because the maximal collector current was limited by the saturation current and never exceeded the latch-up current.

In the early development stage of IGBT, all the researchers tried to increase the latch-up current itself in order to suppress the latch-up of the parasitic thyristor. However, all these efforts failed because IGBT could conduct enormously large current. Successful suppression of the latch-up was made possible by limiting the maximal collector current, which IGBT could conduct, below the latch-up current by controlling/reducing the saturation current of the inherent MOSFET. This was the concept of non-latch-up IGBT. “Becke’s device” was made possible by the non-latch-up IGBT.

The IGBT is characterized by its ability to simultaneously handle a high voltage and a large current. The product of the voltage and the current density that the IGBT can handle reached more than 5×105 W/cm2,[18][19] which far exceeded the value, 2×105 W/cm2, of existing power devices such as bipolar transistors and power MOSFETs. This is a consequence of the large safe operating area of the IGBT. The IGBT is the most rugged and the strongest power device yet developed, affording ease of use and so displacing bipolar transistors and even gate turn-off thyristors (GTOs). This excellent feature of the IGBT had suddenly emerged when the non-latch-up IGBT was established in 1984 by solving the problem of so-called “latch-up,” which is the main cause of device destruction or device failure. Before that, the developed devices were very weak and were easy to be destroyed because of “latch-up.”

Practical devices

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Practical devices capable of operating over an extended current range were first reported by B. Jayant Baliga et al. in 1982.[8] The first experimental demonstration of a practical discrete vertical IGBT device was reported by Baliga at the IEEE International Electron Devices Meeting (IEDM) that year.[20][8] General Electric commercialized Baliga's IGBT device the same year.[5] Baliga was inducted into the National Inventors Hall of Fame for the invention of the IGBT.[21]

A similar paper was also submitted by J. P. Russel et al. to IEEE Electron Device Letter in 1982.[10] The applications for the device were initially regarded by the power electronics community to be severely restricted by its slow switching speed and latch-up of the parasitic thyristor structure inherent within the device. However, it was demonstrated by Baliga and also by A. M. Goodman et al. in 1983 that the switching speed could be adjusted over a broad range by using electron irradiation.[9][22] This was followed by demonstration of operation of the device at elevated temperatures by Baliga in 1985.[23] Successful efforts to suppress the latch-up of the parasitic thyristor and the scaling of the voltage rating of the devices at GE allowed the introduction of commercial devices in 1983,[24] which could be utilized for a wide variety of applications. The electrical characteristics of GE's device, IGT D94FQ/FR4, were reported in detail by Marvin W. Smith in the proceedings of PCI April 1984.[25] Marvin W. Smith showed in Fig.12 of the proceedings that turn-off above 10 amperes for gate resistance of 5kOhm and above 5 amperes for gate resistance of 1kOhm was limited by switching safe operating area although IGT D94FQ/FR4 was able to conduct 40 amperes of collector current. Marvin W. Smith also stated that the switching safe operating area was limited by the latch-up of the parasitic thyristor.

Complete suppression of the parasitic thyristor action and the resultant non-latch-up IGBT operation for the entire device operation range was achieved by A. Nakagawa et al. in 1984.[16] The non-latch-up design concept was filed for US patents.[26] To test the lack of latch-up, the prototype 1200 V IGBTs were directly connected without any loads across a 600 V constant voltage source and were switched on for 25 microseconds. The entire 600 V was dropped across the device and a large short circuit current flowed. The devices successfully withstood this severe condition. This was the first demonstration of so-called "short-circuit-withstanding-capability" in IGBTs. Non-latch-up IGBT operation was ensured, for the first time, for the entire device operation range.[19] In this sense, the non-latch-up IGBT proposed by Hans W. Becke and Carl F. Wheatley was realized by A. Nakagawa et al. in 1984. Products of non-latch-up IGBTs were first commercialized by Toshiba in 1985. This was the real birth of the present IGBT.

Once the non-latch-up capability was achieved in IGBTs, it was found that IGBTs exhibited very rugged and a very large safe operating area. It was demonstrated that the product of the operating current density and the collector voltage exceeded the theoretical limit of bipolar transistors, 2×105 W/cm2, and reached 5×105 W/cm2.[18][19]

The insulating material is typically made of solid polymers which have issues with degradation. There are developments that use an ion gel to improve manufacturing and reduce the voltage required.[27]

The first-generation IGBTs of the 1980s and early 1990s were prone to failure through effects such as latchup (in which the device will not turn off as long as current is flowing) and secondary breakdown (in which a localized hotspot in the device goes into thermal runaway and burns the device out at high currents). Second-generation devices were much improved. The current third-generation IGBTs are even better, with speed rivaling power MOSFETs, and excellent ruggedness and tolerance of overloads.[18] Extremely high pulse ratings of second and third-generation devices also make them useful for generating large power pulses in areas including particle and plasma physics, where they are starting to supersede older devices such as thyratrons and triggered spark gaps. High pulse ratings and low prices on the surplus market also make them attractive to the high-voltage hobbyists for controlling large amounts of power to drive devices such as solid-state Tesla coils and coilguns.

Patent issues

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The device proposed by J. D. Plummer in 1978 (US Patent Re.33209) is the same structure as a thyristor with a MOS gate. Plummer discovered and proposed that the device can be used as a transistor although the device operates as a thyristor in higher current density level.[28] The device proposed by J. D. Plummer is referred here as “Plummer’s device.” On the other hand, Hans W. Becke proposed, in 1980, another device in which the thyristor action is eliminated under any device operating conditions although the basic device structure is the same as that proposed by J. D. Plummer. The device developed by Hans W. Becke is referred here as “Becke’s device” and is described in US Patent 4364073. The difference between “Plummer’s device” and “Becke’s device” is that “Plummer’s device” has the mode of thyristor action in its operation range and “Becke’s device” never has the mode of thyristor action in its entire operation range. This is a critical point, because the thyristor action is the same as so-called “latch-up.” “Latch-up” is the main cause of fatal device failure. Thus, theoretically, “Plummer’s device” never realizes a rugged or strong power device which has a large safe operating area. The large safe operating area can be achieved only after “latch-up” is completely suppressed and eliminated in the entire device operation range.[citation needed] However, the Becke's patent (US Patent 4364073) did not disclose any measures to realize actual devices.

Despite Becke's patent describing a similar structure to Baliga's earlier IGBT device,[5] several IGBT manufacturers paid the license fee of Becke's patent.[14] Toshiba commercialized “non-latch-up IGBT” in 1985. Stanford University insisted in 1991 that Toshiba's device infringed US Patent RE33209 of “Plummer’s device.” Toshiba answered that “non-latch-up IGBTs” never latched up in the entire device operation range and thus did not infringe US Patent RE33209 of “Plummer’s patent.” Stanford University never responded after Nov. 1992. Toshiba purchased the license of “Becke’s patent” but never paid any license fee for “Plummer’s device.” Other IGBT manufacturers also paid the license fee for Becke's patent.

Applications

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As of 2010, the IGBT is the second most widely used power transistor, after the power MOSFET. The IGBT accounts for 27% of the power transistor market, second only to the power MOSFET (53%), and ahead of the RF amplifier (11%) and bipolar junction transistor (9%).[29] The IGBT is widely used in consumer electronics, industrial technology, the energy sector, aerospace electronic devices, and transportation.

Advantages

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The IGBT combines the simple gate-drive characteristics of power MOSFETs with the high-current and low-saturation-voltage capability of bipolar transistors. The IGBT combines an isolated-gate FET for the control input and a bipolar power transistor as a switch in a single device. The IGBT is used in medium to high-power applications like switched-mode power supplies, traction motor control and induction heating. Large IGBT modules typically consist of many devices in parallel and can have very high current-handling capabilities in the order of hundreds of amperes with blocking voltages of 6500 V. These IGBTs can control loads of hundreds of kilowatts.

Comparison with power MOSFETs

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An IGBT features a significantly lower forward voltage drop compared to a conventional MOSFET in higher blocking voltage rated devices, although MOSFETS exhibit much lower forward voltage at lower current densities due to the absence of a diode Vf in the IGBT's output BJT. As the blocking voltage rating of both MOSFET and IGBT devices increases, the depth of the n- drift region must increase and the doping must decrease, resulting in roughly square relationship decrease in forward conduction versus blocking voltage capability of the device. By injecting minority carriers (holes) from the collector p+ region into the n- drift region during forward conduction, the resistance of the n- drift region is considerably reduced. However, this resultant reduction in on-state forward voltage comes with several penalties:

  • The additional PN junction blocks reverse current flow. This means that unlike a MOSFET, IGBTs cannot conduct in the reverse direction. In bridge circuits, where reverse current flow is needed, an additional diode (called a freewheeling diode) is placed in anti-parallel with the IGBT to conduct current in the opposite direction. The penalty isn't overly severe because at higher voltages, where IGBT usage dominates, discrete diodes have a significantly higher performance than the body diode of a MOSFET.
  • The reverse bias rating of the N-drift region to collector P+ diode is usually only of tens of volts, so if the circuit application applies a reverse voltage to the IGBT, an additional series diode must be used.
  • The minority carriers injected into the N-drift region take time to enter and exit or recombine at turn-on and turn-off. This results in longer switching times, and hence higher switching loss [de] compared to a power MOSFET.
  • The on-state forward voltage drop in IGBTs behaves very differently from power MOSFETS. The MOSFET voltage drop can be modeled as a resistance, with the voltage drop proportional to current. By contrast, the IGBT has a diode-like voltage drop (typically of the order of 2V) increasing only with the log of the current. Additionally, MOSFET resistance is typically lower for smaller blocking voltages, so the choice between IGBTs and power MOSFETS will depend on both the blocking voltage and current involved in a particular application.

In general, high voltage, high current and lower frequencies favor the IGBT while low voltage, medium current and high switching frequencies are the domain of the MOSFET.

Modeling

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Circuits with IGBTs can be developed and modeled with various circuit simulating computer programs such as SPICE, Saber, and other programs. To simulate an IGBT circuit, the device (and other devices in the circuit) must have a model which predicts or simulates the device's response to various voltages and currents on their electrical terminals. For more precise simulations the effect of temperature on various parts of the IGBT may be included with the simulation. Two common methods of modeling are available: device physics-based model, equivalent circuits or macromodels. SPICE simulates IGBTs using a macromodel that combines an ensemble of components like FETs and BJTs in a Darlington configuration.[citation needed] An alternative physics-based model is the Hefner model, introduced by Allen Hefner of the National Institute of Standards and Technology. Hefner's model is fairly complex but has shown good results. Hefner's model is described in a 1988 paper and was later extended to a thermo-electrical model which include the IGBT's response to internal heating. This model has been added to a version of the Saber simulation software.[30]

IGBT failure mechanisms

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The failure mechanisms of IGBTs includes overstress (O) and wearout(wo) separately.

The wearout failures mainly include bias temperature instability (BTI), hot carrier injection (HCI), time-dependent dielectric breakdown (TDDB), electromigration (ECM), solder fatigue, material reconstruction, corrosion. The overstress failures mainly include electrostatic discharge (ESD), latch-up, avalanche, secondary breakdown, wire-bond liftoff and burnout.[31]

IGBT modules

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See also

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References

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  1. ^ Basic Electronics Tutorials.
  2. ^ Difference Between IGBT and Thyristor
  3. ^ "1960: Metal Oxide Semiconductor (MOS) Transistor Demonstrated". The Silicon Engine: A Timeline of Semiconductors in Computers. Computer History Museum. Retrieved August 31, 2019.
  4. ^ Majumdar, Gourab; Takata, Ikunori (2018). Power Devices for Efficient Energy Conversion. CRC Press. pp. 144, 284, 318. ISBN 9781351262316.
  5. ^ a b c d Baliga, B. Jayant (2015). The IGBT Device: Physics, Design and Applications of the Insulated Gate Bipolar Transistor. William Andrew. pp. xxviii, 5–12. ISBN 9781455731534.
  6. ^ Baliga, B. Jayant (1979). "Enhancement- and depletion-mode vertical-channel m.o.s. gated thyristors". Electronics Letters. 15 (20): 645–647. Bibcode:1979ElL....15..645J. doi:10.1049/el:19790459. ISSN 0013-5194.
  7. ^ "Advances in Discrete Semiconductors March On". Power Electronics Technology. Informa: 52–6. September 2005. Archived (PDF) from the original on 22 March 2006. Retrieved 31 July 2019.
  8. ^ a b c Baliga, B.J.; Adler, M.S.; Gray, P.V.; Love, R.P.; Zommer, N. (1982). "The insulated gate rectifier (IGR): A new power switching device". 1982 International Electron Devices Meeting. pp. 264–267. doi:10.1109/IEDM.1982.190269. S2CID 40672805.
  9. ^ a b Baliga, B.J. (1983). "Fast-switching insulated gate transistors". IEEE Electron Device Letters. 4 (12): 452–454. Bibcode:1983IEDL....4..452B. doi:10.1109/EDL.1983.25799. S2CID 40454892.
  10. ^ a b Russell, J.P.; Goodman, A.M.; Goodman, L.A.; Neilson, J.M. (1983). "The COMFET—A new high conductance MOS-gated device". IEEE Electron Device Letters. 4 (3): 63–65. Bibcode:1983IEDL....4...63R. doi:10.1109/EDL.1983.25649. S2CID 37850113.
  11. ^ Nakagawa, Akio; Ohashi, Hiromichi; Tsukakoshi, Tsuneo (1984). "High Voltage Bipolar-Mode MOSFET with High Current Capability". Extended Abstracts of the 1984 International Conference on Solid State Devices and Materials. doi:10.7567/SSDM.1984.B-6-2.
  12. ^ Scharf, B.; Plummer, J. (1978). A MOS-controlled triac device. 1978 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. Vol. XXI. pp. 222–223. doi:10.1109/ISSCC.1978.1155837. S2CID 11665546.
  13. ^ B1 Re33209 is attached in the pdf file of Re 33209.
  14. ^ a b U. S. Patent No. 4,364,073, Power MOSFET with an Anode Region, issued December 14, 1982 to Hans W. Becke and Carl F. Wheatley.
  15. ^ "C. Frank Wheatley, Jr., BSEE". Innovation Hall of Fame at A. James Clark School of Engineering.
  16. ^ a b Nakagawa, A.; Ohashi, H.; Kurata, M.; Yamaguchi, H.; Watanabe, K. (1984). "Non-latch-up 1200V 75A bipolar-mode MOSFET with large ASO". 1984 International Electron Devices Meeting. pp. 860–861. doi:10.1109/IEDM.1984.190866. S2CID 12136665.
  17. ^ A. Nakagawa, H. Ohashi, Y. Yamaguchi, K. Watanabe and T. Thukakoshi, "Conductivity modulated MOSFET" US Patent No. 6025622 (Feb. 15, 2000), No. 5086323 (Feb. 4, 1992) and No. 4672407 (Jun. 9, 1987).
  18. ^ a b c Nakagawa, A.; Yamaguchi, Y.; Watanabe, K.; Ohashi, H. (1987). "Safe operating area for 1200-V nonlatchup bipolar-mode MOSFET's". IEEE Transactions on Electron Devices. 34 (2): 351–355. Bibcode:1987ITED...34..351N. doi:10.1109/T-ED.1987.22929. S2CID 25472355.
  19. ^ a b c Nakagawa, A.; Yamaguchi, Y.; Watanabe, K.; Ohashi, H.; Kurata, M. (1985). "Experimental and numerical study of non-latch-up bipolar-mode MOSFET characteristics". 1985 International Electron Devices Meeting. pp. 150–153. doi:10.1109/IEDM.1985.190916. S2CID 24346402.
  20. ^ Shenai, K. (2015). "The Invention and Demonstration of the IGBT [A Look Back]". IEEE Power Electronics Magazine. 2 (2): 12–16. doi:10.1109/MPEL.2015.2421751. ISSN 2329-9207. S2CID 37855728.
  21. ^ "NIHF Inductee Bantval Jayant Baliga Invented IGBT Technology". National Inventors Hall of Fame. Retrieved 17 August 2019.
  22. ^ Goodman, A.M.; Russell, J.P.; Goodman, L.A.; Nuese, C.J.; Neilson, J.M. (1983). "Improved COMFETs with fast switching speed and high-current capability". 1983 International Electron Devices Meeting. pp. 79–82. doi:10.1109/IEDM.1983.190445. S2CID 2210870.
  23. ^ Baliga, B.Jayant (1985). "Temperature behavior of insulated gate transistor characteristics". Solid-State Electronics. 28 (3): 289–297. Bibcode:1985SSEle..28..289B. doi:10.1016/0038-1101(85)90009-7.
  24. ^ Product of the Year Award: "Insulated Gate Transistor", General Electric Company, Electronics Products, 1983.
  25. ^ Marvin W. Smith, "APPLICATIONS OF INSULATED GATE TRANSISTORS" PCI April 1984 PROCEEDINGS, pp. 121-131, 1984 (Archived PDF [1])
  26. ^ A.Nakagawa, H. Ohashi, Y. Yamaguchi, K. Watanabe and T. Thukakoshi, "Conductivity modulated MOSFET" US Patent No.6025622(Feb.15, 2000), No.5086323 (Feb.4, 1992) and No.4672407(Jun.9, 1987)
  27. ^ "Ion Gel as a Gate Insulator in Field Effect Transistors". Archived from the original on 2011-11-14.
  28. ^ Scharf, B.; Plummer, J. (1978). "A MOS-controlled triac device". 1978 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. pp. 222–223. doi:10.1109/ISSCC.1978.1155837. S2CID 11665546.
  29. ^ "Power Transistor Market Will Cross $13.0 Billion in 2011". IC Insights. June 21, 2011. Retrieved 15 October 2019.
  30. ^ Hefner, A.R.; Diebolt, D.M. (September 1994). "An experimentally verified IGBT model implemented in the Saber circuit simulator". IEEE Transactions on Power Electronics. 9 (5): 532–542. Bibcode:1994ITPE....9..532H. doi:10.1109/63.321038. S2CID 53487037.
  31. ^ Patil, N.; Celaya, J.; Das, D.; Goebel, K.; Pecht, M. (June 2009). "Precursor Parameter Identification for Insulated Gate Bipolar Transistor (IGBT) Prognostics". IEEE Transactions on Reliability. 58 (2): 271–276. doi:10.1109/TR.2009.2020134. S2CID 206772637.

Further reading

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